Temperature and Interface Traps Compensation in MOS Bias Controlled Cycled Dosimeters

J. LIPOVETZKY, M. GARCIA INZA, S. CARBONETTO, E. REDIN, A. FAIGON.

Buenos Aires, Argentina

Conferencia; EAMTA 2008 Argentine School of Micro-Nanoelectronics, Technology and Applications; 2008

MOS dosimetry employing the Bias Controlled Cycled Measurement technique is investigated regarding its ability to compensate threshold voltage drifts superimposed to the signal, inducing measurement errors. Two sources of drifts were addressed: drifts due to interface states creation, and drifts due to temperature variations. The first case was measured and modeled; the second was numerically simulated using the same model. The results show that the good compensation observed for interface states creation would also occur for temperature induced drifts, reducing at least one order of magnitude the measurement error compared to  non-compensated standard MOS dosimeters.