C. QUINTEROS; A. HARDTDEGEN; M. BARELLA; F. GOLMAR; F. PALUMBO; J. CURIALE; S. HOFFMANN-EIFERT; P. LEVY

The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials

New Uses of Micro and Nanomaterials

Lugar: London; Año: 2018; p. 3 - 23