Electron Beam Lithography at CIC nanoGUNE: Nanodevices and Applications

P. ALONSO; L. ARZUBIAGA; F. CASANOVA; F. GOLMAR; L. HUESO; R. HILLENBRAND; M. ISASA; R. LLOPIS; E. MASSOURAKIS; L. PIETROBON; M. SCHNELL; E. VILLAMOR

San Sebastián

Workshop; NANOLITHO 2012, 5th Spanish Workshop on Nanolithography; 2012

CIC nanoGUNE

We present several examples of nanostructures created by electron beam lithography at CIC nanoGUNE. These structures are employed for different research topics, such as plasmonic nano-antennas [1, 2], spintronic devices [3] and organic field-effect transistors [4]. In this presentation we will focus on: - High-resolution lithography on insulating substrates for nanoplasmonics. - Electromigration in metallic nanowires for the creation of sub-5 nm gaps. - Lithography and shadow mask evaporation for obtaining high aspect ratio nanogaps. - Lithography on graphene/SiC substrate for spintronic devices. - Lithography and etching for studying interfacial and spin effects between different metals. We will give a brief overview of the nanofabrication facilities available at CIC nanoGUNE and the different optimization steps performed for the nanofabrication of the presented devices. References [1] M. Schnell, P. Alonso-González, L. Arzubiaga, F. Casanova, L. E. Hueso, A. Chuvilin and R. Hillenbrand, Nature Photonics 5, 283 (2011). [2] P. Alonso-González, , P. Albella, M. Schnell, J. Chen, F. Huth, A. Garcia-Etxarri, F. Casanova, F. Golmar, L. Arzubiaga, L. E. Hueso, J. Aizpurua and R. Hillenbrand, Nature Communications 3, 684 (2012). [3] F. Casanova, A. Sharoni, M. Erekhinsky, I. K. Schuller, Phys. Rev. B 79, 184415 (2009). [4] F. Golmar, M. Gobbi, R. Llopis, P. Stoliar, F. Casanova and L.E. Hueso, Organic Electronics 13, 2301-2306 (2012).