Nitrobenzene Degradation Using UV Radiation in Presence of H2O2 And UV Radiation in Presence of KNO3.

FERNANDO S. GARCÍA EINSCHLAG; JUAN I. FELICE; JUAN M. TRISZCZ; ALBERTO L. CAPPARELLI

Cuidad de Buenos Aires

Conferencia; International Conference on Monitoring Systems and Novel Technologies for Detection/Removal of Pollutants in/from Ecosystems; 2004

              Various advanced oxidation processes (AOP) are nowadays available for achieving oxidative degradation of organic pollutants in aqueous media, and have been increasingly employed in recent years as alternative or complementary treatments to conventional methods of detoxification. Most AOP are based on the production of hydroxyl radicals as primary oxidizing species. The produced HO radicals are used to initiate the destruction of hazarouds organic pollutants.             The UV/H2O2 process is widely applied to the treatment of wastewaters containing a variety of biocidal or non-biodegradable organic contaminants. On the other hand it has long been known that the photolysis of nitrate solutions results in the formation of HO radicals.             In this work, we compare the degradation of nitrobenzene by the UV/H2O2 process with the degradation of nitrobenzene using UV irradiation in presence of NO3K. In both methods 2-nitrophenol, 3-nitrophenol and 4-nitrophenol were detected as primary intermediate products, however a significant amount of phenol were observed in presence of H2O2 whereas a significant amount of 1,3-dinitrobenzene was observed in presence of KNO3.