“Morphologycal Characterization of Block Copolymers by Transmission Electron Microscopy (TEM)”

MARÍA J. YÁÑEZ; MARIO D. NINAGO; LEOPOLDO R. GÓMEZ; ANDRÉS E. CIOLINO; ENRIQUE M. VALLÉS; DANIEL A. VEGA; MARCELO A. VILLAR

Rosario (Santa Fe, Argentina)

Congreso; The Tenth Inter-American Congress of Electron Microscopy 2099 (CIASEM 2009); 2009

Interamerican Committee of Societies for Electron Microscopy

Two kind of block copolymers based on siloxane were studied: poly(styrene)-b-poly(dimethylsiloxane), and poly(butadiene)-b-poly(dimethylsilxoane) (PS-b-PDMS and PB-b-PDMS, respectively). Block copolymers samples were dissolved in selective solvents (toluene and cyclohexane) in order to obtain different solutions (1 and 5 wt%). From these solutions, films were prepared by casting one-drop using water as substrate. The films obtained were transferred to a copper grid, and observed in a JEOL 100 CXII, at 100 kV. Staining techniques were unnecessary due to the difference in electron absorption and scattering of the PDMS block relative to the others (PS and PB).