TDPAC study of a solid-state reaction doping process of 181Hf(181Ta) impurities in the Ho2O3 semiconductor

D. RICHARD; E. L. MUÑOZ; G. DARRIBA; L. A. ERRICO; M. RENTERIA

Ginebra, Suiza

Conferencia; 3rd Joint International Conference on Hyperfine Interactions & International Symposium on Nuclear Quadrupole Interaction; 2010

CERN

In this work we study the ball-milling-assisted solid-state reaction doping method between neutron-activated m-HfO2 and the bixbyite Ho2O3. In order to follow the doping process of 181Hf donor impurities in the semiconductorHo2O3 and to elucidate the effect of each variable involved in the process, time-differential perturbed-angular correlation (TDPAC) experiments were carried out after each step of the doping process. The obtained hyperfineparameters were compared to those of m-HfO2, to those expected for Ho2O3 using a well established electric-field gradient (EFG) systematics for 181Ta in bixbyite sesquioxides, and to TDPAC results obtained in Ho2O3 samplesdoped by ion implantation of 181Hf(→181Ta). As we will show, we could determine the effect played by the milling and the thermal treatments, showing the capability of the TDPAC technique to follow the doping process and to giveinformation about the inter-diffusion processes. We also demonstrate the excellent efficiency of the ball-milling-assisted solid-state reaction process to locate Hf donor impurities at the defect-free cationic sites of the Ho2O3semiconductor, quantifying directly the amount of impurities doped after each step of the process.