Gas-Phase Infrared Laser Photolysis of Phenylsilane

JUAN J. NAJERA; JORGE O. CACERES; SILVIA I. LANE

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY

ELSEVIER SCIENCE SA

Lugar: Amsterdam; Año: 2000 vol. 131 p. 1 - 11

1010-6030

The IRMPA and IRMPD processes of phenylsilane were investigated from absorption measurements, reaction probabilities and quantitative product analysis. The laser absorption cross-section was determined as L D(1.340.08)10−18 cm2 which coincides with the conventional IR absorption cross-section. It was found that neat PhSiH3 or in the presence of Ar behaves like the so-called ?large molecules? showing no restrictions to the multiphoton absorption process. Decomposition occurs through collisional assisted processes of energy pooling. End product analysis from IRMPD of PhSiH3 shows that the main dissociation channel is the three-center molecular elimination of H2 and PhSiH. Thus, IRMPD of PhSiH3 proves to be a convenient technique for the generation of PhSiH radicals.