LACCONI Gabriela Ines
congresos y reuniones científicas
Electrodeposition of copper onto modified monocrystalline silicon surfaces
New London, NH, Estados Unidos
Conferencia; Gordon Research Conference on Electrodeposition; 2010
Institución organizadora:
Gordon Research Conference
Electrodeposition of copper onto modified monocrystalline silicon surfaces? M. B. Quiroga Argañaraz, J. Klug, G. Riveros Patroni, G. I. Lacconi INFIQC, Dpto. Fisicoquímica, Facultad Ciencias Químicas, Universidad Nacional de Córdoba, Argentina. Dpto. Química y Bioquímica, Facultad Ciencias, Universidad de Valparaíso, Chile. Surface modification of silicon with highly robust Si-C linked organic monolayers is currently an area of intensive research not only because of its technological applications for passivating or bio-functionalizing semiconductor devices but also for the study of chemical and electronic processes at the semiconductor surface [1]. The preparation of hybrid molecular-semiconductor devices or chemical biosensors requires a detailed understanding of the silicon/organic layer interface. It is very well-known that the anodic oxidation of silicon surfaces is a preparation method for very thin and reproducible oxides to be used in ultralarge-scale integrated devices [2]. On the other hand, various synthetic strategies have been developed over the past few years to form alkyl-terminated and functionalized monolayers on silicon. These include photochemical and thermally induced hydrosilylation, free-radical initiation and Lewis acid catalyzed reactions [3]. The purpose of this communication is to study the electrochemical oxidation of the hydrogenated-Si(111) surfaces in order to obtain suitable platforms for studying the properties of biological membranes. The synthesis and characterization of compact alkyl monolayers covalently attached to n-Si(111) surfaces is also performed. The aim of the investigation is completed by copper electrodeposition onto the functionalized surfaces [4]. The electrochemical behaviour of Si(111)-H surfaces is performed by the anodic oxide growth obtained under different experimental conditions (potential-time program, solution pHs, etc.). Functionalized surfaces (Si-R) are obtained by the formal hydrosilylation reaction between 1-octadecene and Si-H substrates, which is initiated by heating the samples at temperatures over the electrochemical characterization of the organic functionalized silicon surfaces was performed by cyclic voltammetry, principally related to the inhibition of the silicon oxide formation. Direct correlations between the electrical properties of the film, hydrophobicity of the layer and passivation of the surface with the experimental conditions of the synthesis are established. On the other side, copper was electrodeposited onto the functionalized silicon surface by the application of potential pulses. The results show that the nuclei formation occurs at the monolayers defects. The kinetic of nucleation and growth of the copper crystals was established by the analysis of the current transients at different potential values. Structural characterization of the oxidized, derivatized surfaces and the copper deposited crystallites was performed by ex-situ NC-AFM. 1.- G. Oskam, J. G. Long, A. Natarajan and P. C. Searson, J. Phys. D: Appl. Phys. 2.- F. Bensliman, A. Fukuda, N. Mizuta, M. Matsumura, J. Electrochem. Soc. 3.- Bruno Fabre, Fanny Auquier, Philippe Allongue J. Electroanal. Chem(2009) 63? 68. 4.- M. B. Quiroga Argañaraz, Cecilia I. Vázquez and G. I. Lacconi, J. Electroanal. Chem. 639(2010) 95 ? 101.