INVESTIGADORES
CAFARO Vanina Guadalupe
congresos y reuniones científicas
Título:
A SIMULATION-BASED FRAMEWORK FOR INDUSTRIAL AUTOMATED WET-ETCH
Autor/es:
ADRIÁN M. AGUIRRE; VANINA G. CAFARO; CARLOS A. MÉNDEZ; PEDRO M. CASTRO
Lugar:
Roma
Reunión:
Simposio; 23rd European Modeling & Simulation Symposium (Simulation in Industry); 2011
Institución organizadora:
European Modeling & Simulation Symposium (Simulation in Industry)
Resumen:
This work presents the development and application of an advanced modelling, simulation and optimizationbased framework to the efficient operation of the Automated Wet-etch Station (AWS), a critical stage in Semiconductor Manufacturing Systems (SMS). Lying on the main concepts of the processinteraction approach, principal components and tools available in the Arena® simulation software were used to achieve the best representation of this complex andhighly-constrained manufacturing system. Furthermore, advanced Arena templates were utilized for modelling very specific operation features arising in the process under study. The major aim of this work is to provide a novel computer-aided tool to systematically improve the dynamic operation of this critical manufacturing station by quickly generating efficient schedules for the shared processing and transportation devices.