Kinetics of Arsenic (III) Oxidation Employing the UV/H2O2 Process

M.R. LESCANO; C.S. ZALAZAR; A.E. CASSANO; R.J. BRANDI

Encuentro; 7° European Meeting on Solar chemistry and photocatalysis: environmental applications; 2012

Sociedade Portuguesa de Química

The oxidation of arsenic (III) in aqueous solutions employing the UV/H2O2 process is reported in this work. A mathematical model was derived from a proposed, simple reaction sequence to represent the kinetics of arsenic oxidation. The model predictive quality was validated with experimental data. Experimental runs were performed by varying the H2O2 concentration and incident radiation. The H2O2 production of OH radicals is greatly enhanced by the absorbed UVC radiation, which is the main responsible for the As (III)  As (IV) reaction. The simplified model has only three parameters (two known from previous works and the other unknown). Good agreement was obtained between model predictions an experimental data as a starting approach to the study of arsenic oxidation