Electro-Nanopatterning in Two Different Substrates: Si (100) and Azo Containing Polymer

I. ZALAKAIN; R. FERNÁNDEZ; J. A. RAMOS; M. J. GALANTE; P. A. OYANGUREN; I. MONDRAGON

Barcelona (España)

Congreso; Nanolitho (Second Spanish Workshop on Nanolithography); 2008

Nowadays, technological development involves the miniaturization of devices and structures. Due to their small spatial dimension, a reduction of size down to 40 nm and beyond is necessary but this is complicated because of physics limits of manufacture. Local anodic oxidation (LAO) using atomic force microscope (AFM) is one of the nanolithography techniques for fabrication of nanometer-scaled structures and devices  In this work, controlled patterns using AFM have been built in different substrates: a silicon wafer and a polymer film containing azobenzene moieties.