Characterization of fabrication process of micro and nanopores on silicon substrate by electrochemical method

C. OLMOS; M. DER; G. ROSERO; T. FERNANDEZ; M. DIEGUEZ; F. SACCO; P. GRANELL; F. GOLMAR; C. LASORSA; B .LERNER; M.S.PEREZ

REVISTA MATéRIA

UNIV FED RIO DE JANEIRO

Lugar: Rio de Janeiro; Año: 2018 vol. 23

1517-7076

A series of nanopores and micropores on crystalline silicon wafers by wet etching technique were frabricated and was studied the effect of electrical potential applied on the fabrication of pores. From the data obtained of the evolution of the current registered in time it was possible to characterize the process and determine the time of pore formation. It was found that the use of KOH 4M, process temperature at 84 ˚C, HCl such as braking agent and applying potencial of 0,1 V, 0,5 V y 1 V allows the formation of pores and the characteri-zation of the process .