Modeling surface morphology after deposition, adsorption, and etching in Si(100)

C.M. ALDAO

Lahore, Pakistan

Congreso; International School on Surfaces, Thin Films, Nanostructures and Applications; 2006

A variety of processes can be responsible for the morphology of surfaces in equilibrium or after the addition or the removing of material.  We focus on Si(100), the surface used in making chips, to explore the effects of a variety of experiments.  In particular, we study homoepitaxial at submonolayer coverages, surface roughening due to adsorbates, and wet etching.  Monte Carlo simulations are used to explore the consequences of the proposed basic mechanisms.