Surface growth by random deposition of rigid and wetting clusters

D.A. MIRABELLA; C.M. ALDAO

SURFACE SCIENCE

ELSEVIER SCIENCE BV

Lugar: Amsterdam; Año: 2016 vol. 646 p. 282 - 287

0039-6028

Surface grown by the deposition of rigid and wetting clusters has been investigated using Monte Carlo simulations in 1 + 1 dimensions. Dynamic scaling exponents were determined using the time evolution of the roughness, the local width, the height?height correlation function, and the power spectrum. The values obtainedfor the roughness exponent clearly reflect the growth mechanism adopted for deposition. In the case of wettingclusters, the roughness exponent corresponds to that of random deposition, but a correlation appears for lowwindow size, with a crossover that is related to the average cluster size and cluster size distribution. On theother hand, rigid cluster deposition belongs to the KPZ universality class.However, determined scaling exponents converge very slowly to those corresponding to KPZ.