INVESTIGADORES
ALDAO celso Manuel
artículos
Título:
3d Transition Metals on InP(110): A Comparative Study of Reactive Interface Evolution
Autor/es:
C.M. ALDAO; I.M. VITOMIROV; F. XU; J.H. WEAVER
Revista:
PHYSICAL REVIEW B - CONDENSED MATTER AND MATERIALS PHYSICS
Editorial:
APS
Referencias:
Año: 1988 vol. 37 p. 6019 - 6026
ISSN:
0163-1829
Resumen:
Room-temperature formation of reactive M/InP{110) interfaces (where M denotes the 3d transition
metals Ti, Cr, Fe, and Co) have been studied using high-resolution synchrotron radiation photoemission.
Detailed line-shape analysis shows that these metals disrupt the substrate to form phosphides
and release In atoms to the free surface. For Ti and Cr depositions, there are also ultrathin
transition regions or precursors to reaction, which are not observed for Fe and Co, but these precursors
do not correlate clearly w'ith Schottky barrier development or Snal height. Critical coverages
of -7 A for Ti, -4 A for Cr, -2.7 A for Fe, and -1.6 A for Co are found which re6ect morphology
changes in the disrupted overlayer, namely, growth of metal-phosphide nuclei and expulsion of
0 In from the region where compound formation dominates. For depositions greater than -22 A for
Ti, ?12 A for Cr, and -7 A for Fe and Co, the interface reactions become diffusion limited and
the phosphide-rich regions are buried by metallic overlayers. At the same time, In atoms released
during earlier stages continue to segregate because of their low solubility in these metals. Comparisons
are made to GaAs-based interfaces where epitaxial growth of Fe and Co eras observed.