Morphological Study Of Palladium Thin Films Deposited By Sputtering

K L SALCEDO; F.A. PEREZ; H. RIASCOS

Lima

Encuentro; VII Reunión Iberoamericana de Óptica (RIAO) X Encuentro Latinoamericano de Óptica, Láseres y Aplicaciones (OPTILAS),; 2010

PONTIFICIA UNIVERSIDAD CATÓLICA DEL PERÚ

This paper presents a morphological analysis of thin films of palladium (Pd)deposited on a substrate of sapphire (Al2O3) at a constant pressure of 3.5 mbarat different substrate temperatures (473 K, 523 K and 573 K). The films weremorphologically characterized by means of an Atomic Force Microscopy (AFM);finding a relation between the roughness and the temperature. A morphologicalanalysis of the samples through AFM was carried out and the roughness wasmeasured by simulating the X-ray reflectivity curve using GenX software. Adirect relation between the experimental and simulation data of the Palladiumthin films was found.