Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser

P. W. WACHULAK; D. PATEL; M. G. CAPELUTO; C.S. MENONI; J.J. ROCCA; M. C. MARCONI

San diego, CA. USA

Conferencia; SPIE Optics and Photonics Conference, Solf X-Ray lasers and Applications VII; 2007

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directrly patterned on the surface of diferent photoresist. Multiple exposures with a Lloyd´s mirror nterferometer printed arrays of holes and dots over an area of 0.5x0.5mm2 with typical diameters down to 60nm full width at half maximum. This laser-based soft X-ray interferometric tool demostrated the possilility to print different nanoscale patterns using a compact table-top set up.