INVESTIGADORES
CAPELUTO Maria Gabriela
artículos
Título:
Nanopaterning with interferometric lithography using a compact lambda= 46.9 nm laser
Autor/es:
M.G CAPELUTO; G. VASCHENKO; M. GRISHAM; M.C. MARCONI; S. LUDUEÑA; L. PIETRASANTA; C.S. MENONI; J.J. ROCCA; Y. LU; B. PARKINSON
Revista:
IEEE Transactions on Nanotechnology
Editorial:
IEEE
Referencias:
Año: 2006 vol. 1 p. 3 - 7
ISSN:
1536-125X
Resumen:
We report the imprinting of nanometer-scale gratings by interferometric lithography at lambda= 46 9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyds mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications
