Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser: Proceedings of SPIE- The International Society for Optical Engineering Conference on Soft X-Ray Lasers and Applications VII

P.W. WACHULAK; D. PATEL; M. G. CAPELUTO; C.S. MENONI; J.J. ROCCA; M. C. MARCONI

SPIE

SPIE-Gregory J. Tallents, James Dunn editors

Lugar: San Diego, CA; Año: 2007 vol. 6702 p. 1 - 5

0277-786X

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directrly patterned on the surface of diferent photoresist. Multiple exposures with a Lloyd´s mirror nterferometer printed arrays of holes and dots over an area of 0.5x0.5mm2 with typical diameters down to 60nm full width at half maximum. This laser-based soft X-ray interferometric tool demostrated the possilility to print different nanoscale patterns using a compact table-top set up.