“Pattern-Preserving Deposition: Experiments and Modelling”

M.F. CASTEZ; M. FONTICELLI; O. AZZARONI; R.C. SALVAREZZA; H.G. SOLARI

APPLIED PHYSICS LETTERS

Año: 2005 p. 123104 - 123106

0003-6951

In this work we discuss pattern-preserving growth during metal deposition from the vapor on micro/nano-structured metal substrates. Experimental results for Cu deposition on patterned Cu substrates show pattern preserving growth or pattern destruction depending on the incident angle. We introduce a mesoscopic 1+1 dimensional model including deposition flow directed and isotropic, surface diffusion and shadowing effects that account for the experimental growth data. Moreover, simulations on post-deposition annealing, for high aspect-ratio patterns show departures from the predictions of the linear theory for surface diffusion.