Random sequential adsorption of polyatomic species with the presence of impurities

V. CORNETTE; A.J. RAMIREZ-PASTOR; F.NIETO

PHYSICA A - STATISTICAL AND THEORETICAL PHYSICS

ELSEVIER SCIENCE BV

Lugar: Amsterdam; Año: 2011 vol. 390 p. 671 - 679

0378-4371

Random sequential adsorption of k-mers (particles occupying k adsorption sites onthe substrate) of different sizes and shapes deposited on square lattices is studied.Heterogeneous surfaces caused by impurities previously and randomly deposited areconsidered. Thus, an adsorption site occupied by an impurity is considered as forbidden forthe deposition of adsorbent. As a consequence, the average coordination number for eachavailable element depends on the concentration of impurities. For discrete models, at thelate stage the surface coverage evolves according to θ(t) = θ(∞) − A exp [− t/σ ], whereθ(∞) is the jamming coverage while A and σ are fitting parameters. The dependence ofthe terminal relaxation time σ (which determines how fast the lattice is filled up to thejamming coverage) on the parameters of the problem is established.