INVESTIGADORES
GIOVANETTI Lisandro Jose
congresos y reuniones científicas
Título:
Formation of NiSi2 nanocrystalline platelets endotaxially growth in Si(001) wafer
Autor/es:
D. S. COSTA; G. KELLERMANN; A. F. CRAIEVICH; L. J. GIOVANETTI; C. HUCK-IRIART; F. G. REQUEJO; I. G. ZANELLA; R. P. CARDOSO; I. MAZZARO
Lugar:
Camboriu
Reunión:
Congreso; XVIII SBPMat; 2019
Institución organizadora:
SBPMAT
Resumen:
An alternative method is proposed to obtain NiSi2 nanoplatelets embedded in single crystalline Si wafers having the shape of nearly regular hexagons and small dispersion in their size. The method of preparation consists in the deposition of a wet solution containing Ni and TEOS on a Si(001) wafer followed by drying and thermal treatments to promote the diffusion of Ni throughout the Si interface and subsequent formation of the NiSi2 nanoplatelets. The sample was characterized by X-ray reflectivity and grazing-incidence small-angle X-ray scattering. The results showed the NiSi2 nanoplatelets grow coherently with crystalline lattice of Si having their hexagonal surface parallel to the lattice planes of the Si{111} crystallographic form and one of the lateral sides of hexagons intercepting the wafer surface.
