INVESTIGADORES
GIOVANETTI Lisandro Jose
congresos y reuniones científicas
Título:
Study by TEM and GISAXS of coherent CoSi2 nanoplates buried in Si(100).
Autor/es:
P.C. DOS SANTOS CLARO; L. J. GIOVANETTI; F. G. REQUEJO; LUCIANO A. MONTORO; ANTONIO J. RAMIREZ; A. F. CRAIEVICH.; G. KELLERMANN
Lugar:
Gramado, Rio Grande do Sul
Reunión:
Congreso; X Encontro Anual da Sociedade Brasileira de Pesquisa em Materiais (SBPMat); 2011
Institución organizadora:
SBPMat
Resumen:
Motivated by the interest in technology, the size reduction of components
for modern silicon-based integrated circuit (IC) is at the present time a very
important task. Great attention had been given to investigations of self-ordered
materials at nanoscale level exhibiting low resistivity and high thermal
stability.1-3 Particularly important, not only for fundamental
sciences but also for modern silicon-based IC technologies, are the studies of silicon/metal
interactions, nucleation processes, atomic diffusion and growth of silicide
nanoparticles embedded in silicon matrices. In this work we describe a
controlled and reproducible procedure for obtaining very thin hexagonal CoSi2
nanoplatelets within a Si(100) wafer. A thin silica film containing Co atoms
was deposited on the surface of a Si(100) wafer and annealed at 750°C. This
thermal treatment was responsible for the formation of spherical Co
nanoparticles embedded in the silica film and a few atomic layer thick CoSi2
nanoplatelets within the Si(100) wafer. The morphology, structure and spatial
orientation of the CoSi2 nanoplatelets incrusted in the Si crystal
were characterized by synchrotron grazing-incidence small-angle x-ray
scattering (GISAXS) and transmission electron microscopy (TEM). The
experimental results show that the CoSi2 nanoplatelets have nearly
regular hexagonal shape and a uniform thickness. It was also observed that the
CoSi2 nanoplatelets lattice is coherent with the Si lattice and
parallel to one of the four planes of the {111} crystallographic form of the
silicon lattice, indicating that the CoSi2 crystals grow with a
Si{111} habit plane.
Keywords: crystal growth, nanoscale, GISAXS,
integrated circuit.
This
work was supported by LNLS, CNPq and FAPESP, Brazil;
PICT 2008‐00038 (ANPCYT) and PIP 112‐200801‐03079 (CONICET), Argentina; and CIAM collaborative project
(CONICET/CNPq).
[1] Barth, J. V.; Costantini, G.; Kern, K.,. Nature 2005, 437 (7059), 671-679.
[2] Chen, L. J., Metal Silicides: Journal of
Operations Management 2005, 57 (9), 24-31.
[3] Adams, D. P.; Yalisove, S. M.; Eaglesham, D. J., Journal
of Applied Physics 1994, 76 (9), 5190-5194.
Corresponding author: G. Kellermann, Departamento
de Física, Universidade Federal do Paraná, Caixa Postal
19091, Curitiba, PR 81531-990, Brazil, e-mail:
keller@fisica.ufpr.br