INVESTIGADORES
LAROTONDA Miguel Antonio
congresos y reuniones científicas
Título:
EUV imaging with a 13 nm tabletop laser reaches sub-38 nm spatial resolution
Autor/es:
VASCHENKO, G.; BRIZUELA, F.; BREWER, C.; MIGUEL ANTONIO LAROTONDA; WANG, Y.; LUTHER, B. M.; MARCONI, M. C.; ROCCA, J. J.; MENONI, C. S.; CHAO, W.
Lugar:
San José, California
Reunión:
Congreso; 10th Technical Conference on Emerging Lithographic Technologies; 2006
Institución organizadora:
SPIE-INT SOC OPTICAL ENGINEERING
Resumen:
We have acquired images with sub-38 nm spatial resolution using a tabletop extreme ultraviolet (EUV) imaging system operating at a wavelength of 13.2 nm, which is within the bandwidth of Mo/Si lithography mirrors This zone plate-based, full-field microscope has the power to render images in only several seconds with up to a 10,000 μm2 field of view. The ability to acquire such high-resolution images using a compact EUV plasma laser source opens many possibilities for nanotechnology, including in-house actinic inspection of EUV lithography mask blanks.
