Optical properties of nanostructures based on silicon rich silicon oxide thin films

T. ROSCHUK; J. WOJCIK; D. COMEDI; M. J. FLYNN; E. A. IRVING; O. H. Y. ZALLOUM; P. MASCHER

Quebec City

Congreso; 207th Electrochemical Society Meeting; 2005

The Electrochemical Society

(Invited Article) In this paper we discuss important issues associated with the fabrication of silicon-rich silicon oxide (SRSO) thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD), with compositions ranging from silicon dioxide, SiO2, to amorphous silicon, a-Si.  This large range of compositions is reflected in a wide range of optical properties, which can be exploited for photonic applications, such as waveguide structures.  Second, we provide a summary of the optical properties of these structures, obtained by spectroscopic ellipsometry, photoluminescence (PL) and Fourier transform infrared spectroscopy (FTIR).  Finally, we address morphological issues arising from high temperature annealing and their consequences on the optical properties of the materials.