UNIDEF   23986
UNIDAD DE INVESTIGACION Y DESARROLLO ESTRATEGICO PARA LA DEFENSA
Unidad Ejecutora - UE
artículos
Título:
Photoconductivity Measurements in Nanostructured ZnO and ZnO:Al Films
Autor/es:
C. BOJORGE; M. BIANCHETTI; H.R. CANEPA; N. WALSÖE DE RECA
Revista:
Procedia Materials Science
Editorial:
Elsevier
Referencias:
Año: 2015 vol. 8 p. 623 - 629
Resumen:
8128 © 2015 The Authors. Published by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license(http://creativecommons.org/licenses/by-nc-nd/4.0/).Selection and peer-review under responsibility of the scientifi c committee of SAM - CONAMET 2013doi: 10.1016/j.mspro.2015.04.117ScienceDirectInternational Congress of Science and Technology of Metallurgy and Materials, SAM -CONAMET 2013Photoconductivity Measurements in Nanostructured ZnO andZnO:Al FilmsClaudia D. Bojorgea, Mario F. Bianchettib, Horacio R. Cánepab, Noemí Walsöe deRecaa,b, *?aUNIDEF (MINDEF-CONICET)-CITEDEF, Juan Bautista de La Salle 4397, CP 1603 Villa Martelli, Buenos Aires, Argentina.bCONICET, Juan Bautista de La Salle 4397, CP 1603 Villa Martelli, Buenos Aires, Argentina.AbstractZnO is a versatile material used in numerous applications, such as antireflective coatings, transparent electrodes for solar cells,gas sensors, varistors and electro and photoluminescent devices. One of the most important properties of ZnO is thephotoconductivity in the UV, due to the band-gap energy.In this work, nanostructured pure and aluminium doped ZnO films were grown by sol-gel method. The precursor solutions weredeposited with a different quantity of layers by spin-coating technique on SiO2 substrates.The films were characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM).Photoconductivity study of prepared films showed that layers also exhibit sensitivity in the visible spectrum besides a remarkableand usual sensitivity to UV. Performance of pure and doped ZnO films was compared. The UV sensitivity related to the filmthickness was also studied.© 2014 The Authors. Published by Elsevier Ltd.Selection and peer-review under responsibility of the scientific committee of SAM - CONAMET 2013.