Reaction kinetics of diffusing particles injected into a reactive substrate

ALEJANDRO DANIEL SÁNCHEZ; SEBASTIÁN BOUZAT,; HORACIO WIO,

PHYSICAL REVIEW E - STATISTICAL PHYSICS, PLASMAS, FLUIDS AND RELATED INTERDISCIPLINARY TOPICS

APS

Año: 1999 vol. 60 p. 2677 - 2683

1063-651X

We analyze the kinetics of trapping (A+B->B) and annihilation (A+B->0) processes on a one dimensional substrate with homogeneous distribution of immobile B particles while the A particles are supplied by a localized source. For the imperfect reaction case, we analyze both problems by means of a stochastic model and compare the results with numerical simulations. In addition, we present the exact analytical results of the stochastic model for the case of perfect trapping