TiO2 Coatings obtained by cathodic arc deposition on silicon and on glass

A. KLEIMAN; A. MÁRQUEZ; D. G. LAMAS

Rio de Janeiro, Brasil

Congreso; ICAM 2009; 2009

In this work TiO2 thin films prepared by cathodic arc deposition (CAD) on silicon wafers were character toward its implementation in gas sensors. The results were compared with those obtained from films deposited on glass substrates. The crystalline structure of the films was studied by x-ray diffraction (XRD) in the glancing angle geometry, the morphology was observed by atomic force microscopy (AFM) and reflectance measurements in the visible range were also performed.