Coatings deposited by cathodic arc discharges

L. GIULIANI; A. KLEIMAN; M. PIRRERA; D. GRONDONA; H. KELLY; A. MÁRQUEZ

Cdad. de Buenos Aires

Congreso; Workshop Recents developments in complex materials: production and characterization; 2005

Characteristics of films produced with three different systems are presented. TiO2 films are grown with a continuous cathodic arc, employing a Ti cathode and O2 flux. Cu coatings are deposited with the other two devices; one is a pulsed vacuum arc with a straight magnetic filter, and the latter is a continuous vacuum arc with a quarter-torus filter.