Nanostructured Films by Physical Vapor Deposition Photocatalytic Applications

ARIEL KLEIMAN; MAGALÍ XAUBET; ADRIANA MARQUEZ

Industrial Applications of Nanoparticles - A Prospective Overview

CRC Press

Lugar: Boca Raton, FL; Año: 2023;

Physical vapor deposition (PVD) describes a variety of methods for depositing thin films that involve the physical ejection of material in the vapor phase, as atoms or molecules, and the condensation and nucleation of these particles onto a substrate. By introducing chemically reactive gases into the vapor, new compounds can be formed. PVD processes, such as sputtering and cathodic arc, have been widely used to deposit thin coatings to improve corrosion resistance and mechanical and tribological properties of surfaces for applications in the metal-mechanical, automotive and aerospace industries. Wear-resistant and biocompatible coatings for the medical industry are rising use. Photocatalytic films deposited by PVD for self-cleaning and environmental applications are in full development. Among the materials proposed as photocatalysts, titanium dioxide and zinc dioxide have proved to present the highest photocatalytic activity under UV irradiation. Furthermore, doping with transition metals or nitrogen has made both oxides photocatalytically active under visible light. This chapter will cover an overview of the results achieved with nanostructured photocatalytic films by PVD and the challenges to be addressed.