INVESTIGADORES
IEMMI Claudio Cesar
artículos
Título:
New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
Autor/es:
P. WACHULAK; L. URBANSKI; M. CAPELUTO; D. HILL; W. ROCKWARD; CLAUDIO IEMMI; E. ANDERSON; C. MENONI; J. ROCCA; M. MARCONI
Revista:
Journal of Micro/Nanolithography, MEMS, and MOEMS
Editorial:
SPIE
Referencias:
Año: 2009 vol. 8 p. 212061 - 212067
ISSN:
1932-5150
Resumen:
The development of tabletop extreme ultraviolet EUV lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities.
