The electrochemical behaviour of copper in alkaline solutions containing sodium sulphide

M.R. GENNERO DE CHIALVO; A.J. ARVIA

JOURNAL OF APPLIED ELECTROCHEMISTRY

SPRINGER

Lugar: Berlin; Año: 1985 vol. 15 p. 685 - 696

0021-891X

The electrochemical behaviour of copper in NaHCO3 solution (pH 9) and NaOH solutions (pH 14) in the presence of sodium sulphide (10-3 to 5×10-2m) was investigated by using rotating disc electrode and rotating ring-disc techniques, triangular potential scanning voltammetry and potentiostatic steps. When the potential increases from -1.2V upwards, copper sulphide layers are firstly formed at potentials close to the equilibrium potentials of the Cu/Cu2S and Cu/CuS reversible electrodes. When the potential exceeds 0.0 V (NHE), the copper oxide layer is electroformed. Pitting corrosion of copper is observed at potentials greater than -0.3 V. The charateristics of copper pitting are also determined through SEM optical microscopy and EDAX analysis. There are two main effects in the presence of sodium sulphide, namely, the delay in the cuprous oxide formation by the presence of the previously formed copper sulphide layer and the remarkable increase of copper electrodissolution when the potential exceeds the cuprous oxide electroformation threshold potential. These results are interpreted on the basis of a complex structured anodic sulphide layer and on a weakening of the metal-metal bond by the presence of adsorbed sulphur on the copper surface.