INFINA (EX INFIP) 05545
INSTITUTO DE FISICA INTERDISCIPLINARIA Y APLICADA
Unidad Ejecutora - UE
congresos y reuniones científicas
Título:
TiO2 coatings obtained by Cathodic Arc Deposition on silicon substrates
Autor/es:
A. KLEIMAN; A. MÁRQUEZ; D. G. LAMAS
Lugar:
Rio de Janeiro, Brasil
Reunión:
Congreso; XI Internacional Conference in Advancd Materials (ICAM 2009); 2009
Resumen:
TiO2 thin films have been prepared by cathodic arc deposition (CAD) on silicon substrates at different temperatures and bias voltages. The coatings obtained at 400 ºC grew mainly in anatase phase with small quantities of rutile while those synthesized at room temperature resulted amorphous and were crystallized in post-annealing. The structure of the samples was characterized by XRD and the morphology was studied by AFM.
