“Characterization of anodic films formed on copper in 0.1 M borax solution”

S. B. RIBOTTA; L. F. LA MORGIA; L. M. GASSA; M.E. FOLQUER

JOURNAL OF ELECTROANALYTICAL CHEMISTRY

Elsevier

Año: 2007

0022-0728

The duplex copper oxide layer formation process in 0.1 M borax solution has been investigated using different potential/time programs, open circuit potential decay, electrochemical impedance spectroscopy (EIS) and SEM. The importance of the time factor in the degree of stability attained by the different oxide species was underscored. The EIS data enabled the characterization of diffusional processes involved in the duplex layer formation and the estimation of the oxide thickness values which depend on experimental conditions.