Diffusion of implanted nitrogen in the Cu(0 0 1) surface

LUCILA CRISTINA; LILIANA GOMEZ; RICARDO VIDAL; JULIO FERRÓN,

JOURNAL OF PHYSICS - D (APPLIED PHYSICS)

IOP PUBLISHING LTD

Año: 2009

0022-3727

AbstractAuger electron spectroscopy (AES) was used to study the thermally activated diffusion processof low energy N+ implanted on the Cu(0 0 1) surface, a proposed model system forself-assembled nanostructures. The nitrogen diffusion was characterized as a function of thesubstrate temperature and the N+ implantation energy. An experiment that combines atemperature evolution followed by an AES depth profiling was done to clarify the type ofdiffusion. A comparison of the experimental results with kinetic Monte Carlo simulationssuggests a preferential diffusion of the nitrogen to the surface followed by nitridedecomposition.