Total Reflection XRF Analysis. Fundamentals, New Developments and Related Techniques

HECTOR JORGE SANCHEZ; C. A. PÉREZ; M.C. VALENTINUZZI; J. ABRAHAM; M.S. GRENÓN

Barquisimeto (Venezuela)

Simposio; 9th Rio Symposium; 2006

CONFERENCIA INVITADA Total reflection x-ray fluorescence analysis (TXRF) is a well established technique for multielemental characterization of trace and ultra-trace elements in almost every kind of sample. It has been implemented in many spectrochemical laboratories as a more sensitive technique when compared with conventional XRF analysis. The combination of TXRF with non-conventional sources, like synchrotron radiation, has produced significant improvements reaching outstanding detection limits. Total reflection has also been used to study surface properties by means of the standing waves effects that occur at interfaces and on the vicinity of a reflector. New developments in this techniques includes the so-called “beam guides” which allow a very simple implementation of total reflection experiments keeping the same performance of conventional TXRF. The fundamentals of TXRF are presented as well as theoretical basis and working principles of the related techniques. Some examples of applications are shown using different sources and configurations. Considerations are made about surface analysis by total reflection and examples are given. Finally, results obtained with beam guides are presented and a comparison of them with other measurements and theoretical predictions is shown.