A Novel Optimization Method to Automated Wet-Etch Station Scheduling in Semiconductor Manufacturing Systems

Ischia, Napoles

Simposio; 20th European Symposium on Computer Aided Process Engineering; 2010

S. Pierucci; G. Buzzi Ferraris

This work addresses the short-term scheduling of one of the most critical stages in thesemiconductor industry, the automated wet-etch station (AWS). An efficient MILP based computer-aided tool is developed in order to achieve a proper synchronizationbetween the activities of multiple chemical and water baths and limited automatedwafer’s lot transfer devices. The major goal is to find an integrated schedule thatmaximizes the whole process productivity without generating wafer contamination.