A simulation-based framework for industrial automated wet-etch station scheduling problem in the semiconductor industry

A. AGUIRRE; V. CAFARO; C.A. MÉNDEZ; P. CASTRO

Proceedings of the 23rd European Modeling & Simulation Symposium (EMSS2011)

Edit. by A. Bruzzone, M.A. Piera, F. Longo, P. Elfrey, M. Affenzeller and O. Balci

Lugar: Roma ; Año: 2011; p. 384 - 393

This work presents the development and application of an advanced modelling, simulation and optimizationbased framework to the efficient operation of the Automated Wet-etch Station (AWS), a critical stage in Semiconductor Manufacturing Systems (SMS). Lying on the main concepts of the processinteraction approach, principal components and tools available in the Arena® simulation software were used to achieve the best representation of this complex and highly-constrained manufacturing system. Furthermore, advanced Arena templates were utilized for modelling very specific operation features arising in the processunder study. The major aim of this work is to provide a novel computer-aided tool to systematically improve the dynamic operation of this critical manufacturing station by quickly generating efficient schedules for the shared processing and transportation devices.