Dynamic scaling for a competitive growth process: random deposition versus ballistic deposition

HOROWITZ CLAUDIO; ALBANO EZEQUIEL

JOURNAL OF PHYSICS. A - MATHEMATICAL AND GENERAL

Institute of Physics Publishin

Año: 2001 vol. 34 p. 357 - 364

0305-4470

A random-ballistic deposition model where particles are aggregated according to the rules of ballistic deposition with probability “p” and following a random deposition process with probability “1-p”, respectively, is proposed and studied. Based on extensive numerical simulations a dynamic scaling anzats for the interface width W(L,t,p) as a function of lattice side L, time t and p is formulated. Three new exponents, which can be linked to the standard growth exponent of ballistic deposition by means of a new scaling relation, are identified.