INVESTIGADORES
CAPELUTO Maria Gabriela
artículos
Título:
Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
Autor/es:
P.W. WACHULAK; M.G. CAPELUTO; M.C. MARCONI; D. PATEL; C.S. MENONI; J.J. ROCCA
Revista:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B, MICROELECTRONICS AND NANOMETER STRUCTURES PROCESSING, MEASUREMENT AND PHENOMENA
Editorial:
A V S AMER INST PHYSICS
Referencias:
Año: 2007 vol. 25 p. 2094 - 2097
ISSN:
1071-1023
Resumen:
Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for lambda=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5x0.5 mm2 areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds. © 2007 American Vacuum Society. DOI: 10.1116/1.2801870
