Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

P.W. WACHULAK; M.G. CAPELUTO; M.C. MARCONI; C.S. MENONI; J.J. ROCCA

OPTICS EXPRESS

Optical Society of America

Año: 2007 vol. 15 p. 3465 - 3469

1094-4087

Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd’s mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up.