Removal of polystyrene nanoplastics via optimized photo-fenton process: structural analysis and degradation pathways

Z. M. DE PEDRO; J. GARCÍA; C. DI LUCA; A. ABARKAN; L. CHERTA; M. MUNOZ; J. A. CASAS

Florianópolis

Conferencia; VI Iberoamerican Conference on Advanced Oxidation Technologies (VI CIPOA); 2024

Associação Brasileira de Engenharia Química

WWTPs are not fully effective in removing MPs and NPs, thus the development of new technologies to mitigate the discharge of these particles into aquatic environments is currently a priority for the scientific community. AOPs, specifically the photo-Fenton process, appear as a promising technology for NPs removal, being an interesting alternative to conventional treatments. In this study, the elimination of PS NPs of various particle sizes was evaluated under optimized operating conditions, with a specific focus on analyzing structural modifications and generated degradation products. The photo-Fenton process proved effective in oxidizing the PS NPs. An increase in the carbonyl index of the samples was observed due to the addition of oxygenated functional groups on the NPs surface. Furthermore, a variety of polycyclic and monocyclic aromatic hydrocarbons were identified as reaction intermediates, along with short-chain acids. Notably, all these compounds were completely mineralized at the end of the reaction.