Pattern preserving deposition: Experimental results and modeling

MARCOS F. CASTEZ; MARIANO H. FONTICELLI; OMAR AZZARONI; ROBERTO C. SALVAREZZA; HERNÁN G. SOLARI

APPLIED PHYSICS LETTERS

American Institute of Physics

Año: 2005 vol. 87 p. 1231041 - 1231043

0003-6951

In this work we discuss pattern-preserving growth during metal deposition from the vapor on micro/nano-structured metal substrates. Experimental results for Cu deposition on patterned Cu substrates show pattern preserving growth or pattern destruction depending on the incident angle. We introduce a mesoscopic 1+1 dimensional model including deposition flow (directed and isotropic), surface diffusion and shadowing effects that account for the experimental growth data. Moreover, simulations on post-deposition annealing, for high aspect-ratio patterns show departures from the predictions of the linear theory for surface diffusion. isotropic), surface diffusion and shadowing effects that account for the experimental growth data. Moreover, simulations on post-deposition annealing, for high aspect-ratio patterns show departures from the predictions of the linear theory for surface diffusion.