Block copolymer pattern alignement induced by substrrate topography

VEGA DA; GOMEZ LR; VILLAR MA; VALLES EM; MARENCIC A; CHAIKIN PM; REGISTER RA

Punta del Este, Uruguay

Conferencia; Medyfinol 2008; 2008

Medyfinol

We study the kinetics of ordering of a cylinder forming block copolymer thin film confined to lie on a sinusoidal substrate. The process of ordering of a 30nm thick thin film is analyzed trough atomic force microscopy in the tapping mode. We found that the extrinsic curvature plays an important role in the mechanism of evolution towards equilibrium. The anisotropic motion of disclinations leads to the alignment of the block copolymer cylinders in the direction perpendicular to substrate topography.