Determining concentration depth profiles in fluorinated networks

MICCIO L. A.; KUMMALI M. M.; MONTEMARTINI P. E.; OYANGUREN P. A.; SCHWARTZ G. A.; ALEGRÍA A.; COLMENERO J.

JOURNAL OF CHEMICAL PHYSICS

AMER INST PHYSICS

Lugar: Philadelphia; Año: 2011 vol. 135 p. 647041 - 647045

0021-9606

By means of electric force microscopy, composition depth profiles were measured with nanometric resolution for a series of fluorinated networks. By mapping the dielectric permittivity along a line going from the surface to the bulk, we were able to experimentally access to the fluorine concentration profile. Obtained data show composition gradient lengths ranging from 30 nm to 80 nm in the near surface area for samples containing from 0.5 to 5 wt. % F, respectively. In contrast, no gradients of concentration were detected in bulk. This method has several advantages over other techniques because it allows profiling directly on a sectional cut of the sample. By combining the obtained results with x-ray photoelectron spectroscopy measurements, we were also able to quantify F/C ratio as a function of depth with nanoscale resolution.