IFIR   05409
INSTITUTO DE FISICA DE ROSARIO
Unidad Ejecutora - UE
congresos y reuniones científicas
Título:
Analysis of In-Situ and Ex-Situ Textures and Microstructures Obtained by High-Energy Synchrotron X-Rays
Autor/es:
R.E. BOLMARO; N. S. DE VINCENTIS; H.-G. BROKMEIER; EMANUEL BENATTI; ZHENGYE ZHONG; M. C. AVALOS; N. SCHELL
Lugar:
Cancún
Reunión:
Congreso; XXV International Materials Research Congress; 2016
Institución organizadora:
MRS
Resumen:
Massive data coming from through-thickness synchrotron radiation diffraction are complex, and they challenge the analysis efforts. We will show experiments performed in-situ and ex-situ in DESY HEMS outstation synchrotron beam, at Petra III, Hamburg, Germany. The data, collected at 87 KeV, is a complete set of image plates taken every 5o of rotation around the vertical axes to characterize whole orientation dependent variables.Two kinds of experiments were performed. In one of them, the data collection has been done for an Fe-Mn-Si Shape Memory Alloy, deformed in situ by a tensile machine. The evolution of deformation induced phase transformation, texture and microstructure conveys a complex diffraction pattern with peak broadening, overlapping and shifting, all consequence of the simultaneous influence of many kinds of defects. We show an analysis performed by MAUD (Materials Analysis Using Diffraction, L. Lutterotti, University of Trento) software at a few levels of deformations. The analysis is helped by using EBSD at the initial and final stages of deformation, technique that allows the spatial correlation between phases and relationships between orientations and microstructure.Other single-phase cases allow the analysis by models dedicated to the understanding of defect accumulation based on physical approaches designed to fit regular diffractograms. Convolutional Multiple Whole Profile (CMWP) model is one of the most developed ones (T. Ungar et al., Budapest, Hungary). A batch processing has been implemented to fit a few thousands of diffractograms taken from the image plate patterns. The whole processing provides orientation dependent grain sizes and dislocation densities that can be rationalized as result of accumulation mechanisms dependent on plastic anisotropy.