Vanadium Nitride Films Grown by Reactive R.F. Magnetron Sputtering

URRUTIA PALACIOS JHON ALEXANDER; RINCÓN CARLOS; BOLAÑOS GILBERTO; DE LA CRUZ WENCEL

Santa Marta

Congreso; XIII latin american congress of surface science and its applications; 2007

Universidad de los Andes - Universidad Nacional de Colombia

Vanadium nitride thin films were deposited by reactive magnetron sputtering R.F on silicon (100) and glass substrates maintained at temperatures of 723K using a target of 2-inch diameter vanadium with purity of 99.99% and 55 W of power. The nitrogen flux was varied in the 0 to 5 sccm range. Analytical technique including X-ray diffraction XRD, Auger spectroscopy (AES), and X-photoelectron spectroscopy (XPS) were used to characterize the structure and chemical properties. Resistance measurement as a temperature function showed that all films have metallic behavior. Transmittance measurements in the ultraviolet, visible and infrared range were correlated with the nitrogen concentration in the films.