Deep Ion Beam Writing at the TANDAR Laboratory

M.E. DEBRAY; M. FISCHER; A.J. KREINER; A. LAMAGNA; G. REDELICO; M. DAVIDSON; J. DAVIDSON; A. BURLON; D. MINSKY; P. PERILLO

Iguazú, Misiones. Presentación mural

Congreso; VI Latin American Symposium on Nuclear Physics and Applications; 2005

Dpto. de Física FCEN, UBA - Dpto. de Física UNLP – Lab. TANDAR, CNEA

The evolution of the High Aspect Ratio MEMS(HARM) technology is demanding new methods of analysis and micro-machining of advanced materials. This contribution describes the application of the Deep Ion Beam Writing technique using the heavy ion micro-beam at the Tandar accelerator. This is a new application of the micro-beam in this laboratory. The first test with a 16O ion micro-beam at 50 MeV energy to generate 3D micro-structures on PMMA is described.