Fluorescent two-photon nanolithography

DARÍO KUNIK; S. J. LUDUEÑA; COSTANTINO, SANTIAGO; OSCAR EDUARDO MARTÍNEZ

JOURNAL OF MICROSCOPY-OXFORD

WILEY-BLACKWELL PUBLISHING, INC

Lugar: Osford; Año: 2008 vol. 229 p. 540 - 544

0022-2720

Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales.We demonstrate that a precise control of the illumination profile and the scanning speed of the laserbeamis enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy.