Surface percolation and growth. Breaking the diffraction limit in optical lithography.

DARÍO KUNIK; LÍA I. PIETRASANTA; OSCAR E. MARTÍNEZ

PAPERS IN PHYSICS

PapersInPhysics

Lugar: La Plata; Año: 2009 vol. 1 p. 1 - 10

1852-4249

A nanopatterning scheme is presented by which the structure height can be controlled in the tens of nanometers range and the lateral resolution is a factor at least three times better than the point spread function of the writing beam. The method relies on the initiation of the polymerization mediated by a very inefficient energy transfer from a fluorescent dye molecule after single photon absorption. The mechanism has the following distinctive steps: the dye adsorbs on the substrate surface with a higher concentration than in the bulk, upon illumination it triggers the polymerization, then isolated islands develop and merge into a uniform structure (percolation), which subsequently grows until the illumination is interrupted. This percolation mechanism has a threshold that introduces the needed nonlinearity for the fabrication of structures beyond the diffraction limit.